THERMISTOR FILM, THERMISTOR ELEMENT INCLUDING THERMISTOR FILM, AND METHOD FOR MANUFACTURING THE SAME

To provide a thermistor film and a thermistor element having excellent thermistor characteristics even in a high-frequency region, and a manufacturing method capable of industrially advantageously obtaining such a thermistor film and a thermistor element.SOLUTION: A method for manufacturing a thermi...

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Bibliographic Details
Main Authors MATSUDA TOKIYOSHI, YAGYU SHINGO, IGAWA TAKUTO, SASAKI TAKAHIRO
Format Patent
LanguageEnglish
Japanese
Published 04.06.2020
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Summary:To provide a thermistor film and a thermistor element having excellent thermistor characteristics even in a high-frequency region, and a manufacturing method capable of industrially advantageously obtaining such a thermistor film and a thermistor element.SOLUTION: A method for manufacturing a thermistor element 100 includes the steps of: forming a thermistor film 50 including a crystalline oxide and having an electric resistivity less than or equal to 100 kΩcm on a first electrode 51; and forming a second electrode 52 on the side opposite to a surface on the first electrode side of the thermistor film 50. The thermistor element 100 comprises a thermistor film 50, a first electrode 51 arranged on a first surface side of the thermistor film 50, and a second electrode 52 arranged on a second surface side located on the opposite side of the first surface of the thermistor film 50.SELECTED DRAWING: Figure 1 【課題】高周波域においても良好なサーミスタ特性を有するサーミスタ膜およびサーミスタ素子並びにこのようなサーミスタ膜およびサーミスタ素子を工業的有利に得ることができる製造方法を提供する。【解決手段】サーミスタ素子100の製造方法は、第1電極51の上に、結晶性酸化物を含み、電気抵抗率が100kΩcm以下であるサーミスタ膜50を形成する工程及びサーミスタ膜50の第1電極側の面の反対側に、第2電極52を形成する工程を含む。サーミスタ素子100は、サーミスタ膜50と、サーミスタ膜50の第1面側に配置されている第1電極51と、サーミスタ膜50の第1面の反対側に位置している第2面側に配置されている第2電極52と、を有する。【選択図】図1
Bibliography:Application Number: JP20180214239