SUBSTRATE SUPPORTER AND PLASMA PROCESSING APPARATUS

• Main Authors: SASAKI YASUHARU, KOIWA SHINGO
• Format: Patent
• Language: English; Japanese
• Published: 21.05.2020
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERATION; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To satisfy the needs of securing a large distance between a plasma space and each of a first and second conducting wires connected to a first and second electrodes in a chuck region for holding a focus ring, respectively.SOLUTION: A substrate supporter according to a sample embodiment comprises a first support region for supporting a substrate and a second support region for supporting a focus ring. The second support region extends in the circumferential direction. The second support region includes a bottom electrode, a chuck region, and a junction region. The chuck region includes a first electrode and a second electrode. The first electrode and the second electrode extend in the circumferential direction. The first electrode is provided inside the second electrode. In the junction region, a first conducting wire and a second conducting wire connected to the first electrode and the second electrode, respectively, extend in the vicinity of or on a center part between an inner boundary and an outer boundary of the second support region rather than in the vicinity of or on the inner boundary and the outer boundary.SELECTED DRAWING: Figure 3 【課題】フォーカスリングを保持するチャック領域の第１電極及び第２電極にそれぞれ接続された第１導電及び第２導線の各々とプラズマ空間との間に大きな距離を確保することが求められている。【解決手段】例示的実施形態に係る基板支持器は、基板を支持する第１支持領域及びフォーカスリングを支持する第２支持領域を備える。第２支持領域は、周方向に延在している。第２支持領域は、下部電極、チャック領域、及び接合領域を有する。チャック領域は、第１電極及び第２電極を含む。第１電極及び第２電極は、周方向に延在している。第１電極は、第２電極の内側に設けられている。第１電極及び第２電極にそれぞれ接続された第１導線及び第２導線は、接合領域内で、第２支持領域の内側境界及び外側境界よりも、内側境界と外側境界との間の中央部の近く又は中央部上で延在している。【選択図】図３