PROCESS UNIT

To provide a process unit equipped with an electrostatic chuck capable of stably holding a substrate to be processed.SOLUTION: A process unit includes an electrostatic chuck that is disposed on a substrate holding portion, and includes a dielectric and an electrode disposed inside the dielectric, a...

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Bibliographic Details
Main Authors TATEYAMA YOSHIKUNI, FUJIBAYASHI KOJI, SHIBATA HIRONOBU, MITA HIROSHI, HU KAI, YABUI HIDETO
Format Patent
LanguageEnglish
Japanese
Published 23.04.2020
Subjects
BASIC ELECTRIC ELEMENTS
CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GENERATION
SEMICONDUCTOR DEVICES
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Summary:To provide a process unit equipped with an electrostatic chuck capable of stably holding a substrate to be processed.SOLUTION: A process unit includes an electrostatic chuck that is disposed on a substrate holding portion, and includes a dielectric and an electrode disposed inside the dielectric, a circuit electrically connected to the electrodes of the electrostatic chuck, and a first ground wire electrically connected to the circuit. The first ground wire is shielded by a metal via an insulating coating.SELECTED DRAWING: Figure 1 【課題】被処理基板を安定して保持できる静電チャックを備えたプロセス装置を提供する。【解決手段】プロセス装置は、基板保持部に配置され、誘電体と前記誘電体の内部に配置された電極とを含む静電チャックと、前記静電チャックの前記電極に電気的に接続された回路と、前記回路に電気的に接続された第１アース線と、を備える。前記第１アース線は、絶縁性被覆を介して金属によりシールドされる。【選択図】図１
Bibliography:Application Number: JP20180194754