PATTERN SHAPE EVALUATION DEVICE, PATTERN SHAPE EVALUATION SYSTEM, AND PATTERN SHAPE EVALUATION METHOD

• Main Authors: KAWASAKI TAKAHIRO, KAWADA HIROKI, IKODA MASAMI, SHINTANI ATSUKO, HASUMI KAZUHISA
• Format: Patent
• Language: English; Japanese
• Published: 02.04.2020
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

To evaluate line edge roughness or line width roughness while suppressing influence of a noise due to a device and an environment.SOLUTION: An averaged signal profile 405 is obtained by taking a moving average of S pixels (S is an integer greater than 1) in the Y direction from a signal profile indicating a secondary electron signal amount distribution in the X direction with respect to a predetermined Y coordinate obtained from the top-down image. Then, an edge position 406 of a line pattern is extracted on the basis of the averaged signal profile, and a noise floor height is calculated on the basis of a first power spectrum density 407 of the LER data or LWR data based on the extracted edge position, and a second power spectral density 409 of a rectangular window function corresponding to the moving average of the S pixels.SELECTED DRAWING: Figure 4 【課題】ラインエッジラフネスあるいはライン幅ラフネスを、装置や環境に起因するノイズの影響を抑えて評価する。【解決手段】トップダウン画像から得られる所定のＹ座標に対するＸ方向の二次電子信号量分布を示す信号プロファイルをＹ方向にＳ画素（Ｓは１より大きい整数）の移動平均をとった平均化信号プロファイル４０５を求め、平均化信号プロファイルに基づきラインパターンのエッジ位置４０６を抽出し、抽出したエッジ位置に基づくＬＥＲデータまたはＬＷＲデータの第１のパワースペクトル密度４０７と、Ｓ画素の移動平均化に対応する矩形窓関数の第２のパワースペクトル密度４０９とに基づき、ノイズフロア高さを計算する。【選択図】図４