PROCESSING DEVICE, PROCESSING SYSTEM AND PROCESSING METHOD

• Main Authors: GOTO JUNICHI, MIZUNO HIROKI, ITO RYUSUKE, HIROSE MIKIYA, KAWAKAMI TAKASHI, YOSHIKAWA NORIO
• Format: Patent
• Language: English; Japanese
• Published: 26.03.2020
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SEPARATION; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

To provide a technique which can inhibit a foreign matter from separating from a filter when starting to use the filter in filtering liquid with high viscosity.SOLUTION: A processing device 1 processes a filter 100 for filtering processing liquid with high viscosity. The processing device 1 comprises circulation piping 22 for circulating the processing liquid, liquid supply mechanism 23 for generating flow of the processing liquid in the circulation piping 22, and a fitting mechanism 25 and a foreign matter removing filter 24 which are interposed in a middle of a flow path of the circulation piping 22. The fitting mechanism 25 is detachably attached to the filter 100. In aging processing for the filter 100 using such processing device 1, the processing liquid is circulated to be used, which can reduce consumption of the processing liquid. Further, a foreign matter separating from the filter 100 can be removed by a device different from a device that is attached to the filter 100, which can eliminate the necessity of interrupting processing in the device attached to the filter.SELECTED DRAWING: Figure 3 【課題】粘度が高い液体を濾過する際に、フィルタの使用開始時において、フィルタからの異物の離脱を抑制する技術を提供する。【解決手段】この処理装置１は、高粘度の処理液を濾過するためのフィルタ１００を処理するための処理装置である。処理装置１は、処理液を循環させる循環配管２２と、循環配管２２内に処理液の流れを生じさせる送液機構２３と、循環配管２２の流路途中に介挿される装着機構２５および異物除去フィルタ２４とを備える。装着機構２５は、フィルタ１００を着脱自在に装着する。このような処理装置１を用いてフィルタ１００のエージング処理を行えば、処理液を循環して使用するために、処理液の消費量を低減できる。また、フィルタ１００を取り付ける装置と別個の装置でフィルタ１００から離脱する異物を除去できるため、取り付け先の装置における処理を中断する必要が無い。【選択図】図３