FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS

• Main Authors: RUUD OLIESLAGERS, SPRUYTENBURG PATRICK JOHANNES WILHELMUS, THEODORUS WILHELMUS POLET, CORNELIUS MARIA ROPS, JOHANNES CORNELIS PAULUS MELMAN, LEMPENS HAN HENRICUS ALDEGONDA, EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA, GIOVANNI LUCA GATTOBIGIO, YU MIAO, ARTUNC ULUCAN
• Format: Patent
• Language: English; Japanese
• Published: 05.03.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide a lithographic immersion apparatus comprising a fluid handling structure and a method for manufacturing a device.SOLUTION: In an embodiment, the fluid handling structure is configured to confine immersion fluid to a region and comprises a gas knife system, the gas knife system comprising passages each having an exit, the passages comprising a plurality of first passages having a plurality of corresponding first exits, and a plurality of second passages having a plurality of corresponding second exits, in which at least one first passage and at least one second passage are configured such that the stagnation pressure of gas exiting the first exit is greater than the stagnation pressure of gas exiting the second exit, in which the plurality of first passages and the plurality of second passages are mixedly arranged in a row such that the first exits and the second exits form side portions of a shape in plane view.SELECTED DRAWING: Figure 4 【課題】本発明は、流体ハンドリング構造を備えたリソグラフィ液浸装置とデバイス製造方法とを提供する。【解決手段】一実施形態における流体ハンドリング構造は、液浸流体をある領域に閉じ込めるように構成されるとともにガスナイフシステムを備え、ガスナイフシステムは各々が出口を有する通路を備え、通路は複数の対応する第１の出口を有する複数の第１の通路及び複数の対応する第２の出口を有する複数の第２の通路を備え、少なくとも１つの第１の通路及び少なくとも１つの第２の通路は、第１の出口を出ていくガスのよどみ圧が第２の出口を出ていくガスのよどみ圧よりも高くなるように構成されており、複数の第１の通路及び複数の第２の通路は、第１の出口と第２の出口とが平面視である形状の側部を形成するように、一列に混在して配置されている。【選択図】 図４