OPTICAL ELEMENT HAVING STAIN RESISTANT LAYER

• Main Authors: KAWAMATA KAZUO, KATAYAMA ERIKA, SHIBUYA MINORU
• Format: Patent
• Language: English; Japanese
• Published: 27.02.2020
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; METALLURGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PERFORMING OPERATIONS; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

To provide an optical element including a stain resistant layer excellent in durability regardless of the type of a glass material constituting an optical element base material.SOLUTION: The optical element having a stain resistant layer comprises: an optical element base material; a ground layer provided on the surface of the optical element base material; and the stain resistant layer provided on the surface of the ground layer. The ground layer includes a multilayer laminated structure consisting of first to n-th sub ground layers (n is an integer of 2 or more); the first sub ground layer contacting the optical element base material is an assist-less sub ground layer formed by a physical vapor deposition method without an assist; and the n-th sub ground layer contacting the stain resistant film is an assist ground layer formed by the physical vapor deposition method accompanying the assist.SELECTED DRAWING: Figure 1 【課題】 本件発明の課題は、光学素子基材を構成する硝材の種類に関係なく、耐久性に優れた防汚層を備える光学素子を提供することを目的とする。【解決手段】 上記課題を解決するため、光学素子基材と、当該光学素子基材の表面に設けた下地層と、当該下地層表面に設けた防汚層とからなる防汚層付光学素子であって、当該下地層は、第１サブ下地層〜第ｎサブ下地層（ｎは２以上の整数）からなる多層積層構造を備え、当該光学素子基材と接する第１サブ下地層は、アシストを行うことなく物理蒸着法で形成したアシスト無しサブ下地層であり、当該防汚膜と接する第ｎサブ下地層は、アシストを伴う物理蒸着法で形成したアシスト有り下地層であることを特徴とする防汚層付光学素子を採用する。【選択図】図１