MANUFACTURING METHOD OF SILICON CARBIDE SINGLE CRYSTAL

To provide a manufacturing method of a silicon carbide single crystal capable of suppressing generation of a macro defect.SOLUTION: A seed crystal having a first principal plane having a center, and a second principal plane on the opposite side to the first principal plane, a pedestal having a plana...

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Bibliographic Details
Main Authors UETA SHUNSAKU, HARADA MAKOTO, TAKAOKA HIROKI
Format Patent
LanguageEnglish
Japanese
Published 20.02.2020
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Summary:To provide a manufacturing method of a silicon carbide single crystal capable of suppressing generation of a macro defect.SOLUTION: A seed crystal having a first principal plane having a center, and a second principal plane on the opposite side to the first principal plane, a pedestal having a planar third principal plane, and a stationary member, are prepared. The first principal plane is curved protrusively so that the center is positioned on the opposite side to the second principal plane, to a least square plane of the first principal plane. The second principal plane has a central part, and a periphery enclosing the central part. Further, in the state where the first principal plane is arranged oppositely to the third principal plane, the stationary member is allowed to abut on the periphery, to thereby fix the seed crystal to the pedestal. A silicon carbide single crystal is grown on the second principal plane.SELECTED DRAWING: Figure 3 【課題】マクロ欠陥の発生を抑制可能な炭化珪素単結晶の製造方法を提供する。【解決手段】中心を有する第1主面と第1主面の反対側にある第2主面とを有する種結晶と、平面状の第3主面を有する台座と、固定部材とが準備される。第1主面は、中心が第1主面の最小二乗平面に対して第2主面と反対側に位置するように凸状に湾曲している。第2主面は、中央部と、中央部を取り囲む外周部とを有している。さらに、第1主面が第3主面に対向するように配置された状態で固定部材を外周部に当てることにより、種結晶が台座に固定される。第2主面において炭化珪素単結晶を成長させる。【選択図】図3
Bibliography:Application Number: JP20180150262