EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING ARTICLE

• Main Author: SUGITA HIKARI
• Format: Patent
• Language: English; Japanese
• Published: 30.01.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide such technology advantageous in the maintenance of a radiator for adjusting imaging characteristics.SOLUTION: An exposure apparatus for exposing a substrate includes: an optical system having a lens barrel and an optical element disposed inside the barrel; and an adjusting part having a radiator that radiates heat and adjusting imaging characteristics of the optical system by imparting heat to the optical element by the radiator. The radiator is a member including a first end and a second end opposite to the first end and having uniform values of physical properties between the first end and the second end. A center portion between the first end and the second end of the radiator is disposed inside the lens barrel as spaced from the optical element, while the first end and the second end of the radiator are disposed outside the lens barrel.SELECTED DRAWING: Figure 1 【課題】結像特性を調整するための放熱体のメンテナンスの点で有利な技術を提供する。【解決手段】基板を露光する露光装置は、鏡筒とその内部に設けられた光学素子とを有する光学系と、放熱する放熱体を有し、該放熱体により前記光学素子に熱を与えて前記光学系の結像特性を調整する調整部と、を含み、前記放熱体は、第１端部とその反対側の第２端部とを含み、且つ、前記第１端部と前記第２端部との間において物性値が一様な部材であり、前記放熱体における前記第１端部と前記第２端部との間の中央部分は、前記光学素子から離間するように前記鏡筒の内部に配置され、前記放熱体の前記第１端部および前記第２端部は、前記鏡筒の外部に配置されている。【選択図】図１