INFORMATION PROCESSOR, PROGRAM, LITHOGRAPHY DEVICE, LITHOGRAPHY SYSTEM, AND METHOD FOR MANUFACTURING ARTICLE

• Main Authors: KOGA SHINICHIRO, TAKAKURA NOBURU, TAKIGUCHI TAKAHIRO
• Format: Patent
• Language: English; Japanese
• Published: 16.01.2020
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

To provide an information processor that can acquire an inspection condition for performing inspection of a pattern formed on a substrate.SOLUTION: There is provided an information processor that acquires an inspection condition for inspecting a pattern formed by a lithography device that forms a pattern on a substrate by using an original plate. The processor has acquisition means for acquiring a second inspection condition applied when inspecting a second pattern from third information showing a state of the lithography device acquired when forming the second pattern by using a model acquired by machine learning which has, as learning data, first information showing a state of the lithography device acquired when forming a first pattern and second information showing a first inspection condition applied when inspecting the first pattern.SELECTED DRAWING: Figure 7 【課題】 基板上に形成されたパターンの検査を行う検査条件を取得することができる情報処理装置を提供する。【解決手段】 原版を用いて基板上にパターンを形成するリソグラフィ装置によって形成されたパターンを検査する検査条件を取得する情報処理装置であって、第１パターンを形成するときに取得された前記リソグラフィ装置の状態を表す第１情報および前記第１パターンを検査する際に適用された第１検査条件を表す第２情報を学習データとした機械学習により取得されたモデルを用いて、第２パターンを形成するときに取得された前記リソグラフィ装置の状態を表す第３情報から前記第２パターンを検査する際に適用される第２検査条件を取得する取得手段を有する。【選択図】 図７