METHOD FOR FORMING IMPRINT MATERIAL PATTERN, IMPRINT APPARATUS, ADJUSTING METHOD OF IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD

• Main Authors: SATO KOJI, MOROHOSHI HIROSHI
• Format: Patent
• Language: English; Japanese
• Published: 09.01.2020
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

To provide an advantageous technique of satisfactorily correcting an alignment error.SOLUTION: A method is provided for forming a pattern of an imprint material over a shot area of a substrate by using a mold. The method includes a determining step of determining a plurality of marks for alignment of the shot area and the mold, a measurement step of performing measurement for the alignment using the plurality of marks determined in the determining step, a setting step of setting an origin position of a coordinate system for calculating an alignment error between the shot area and the mold on the basis of the arrangement of the plurality of marks determined in the determining step, and a calculation step of calculating the alignment error on the basis of the measurement result of the measurement step and the origin position determined in the setting step.SELECTED DRAWING: Figure 5 【課題】アライメント誤差の補正を良好に行うために有利な技術を提供する。【解決手段】型を用いて基板のショット領域の上にインプリント材のパターンを形成するための方法が提供される。前記方法は、前記ショット領域と前記型とのアライメントのための複数のマークを決定する決定工程と、前記決定工程で決定された前記複数のマークを使って前記アライメントのための計測を行う計測工程と、前記決定工程で決定された前記複数のマークの配置に基づいて、前記ショット領域と前記型とのアライメント誤差を計算するための座標系の原点位置を設定する設定工程と、前記計測工程による計測結果と前記設定工程で決定された原点位置とに基づいて、前記アライメント誤差を計算する計算工程と、を含む。【選択図】図５