EXPOSURE EQUIPMENT, EXPOSURE METHOD AND METHOD FOR PRODUCTION OF ARTICLE

• Main Author: KOSUGI YUJI
• Format: Patent
• Language: English; Japanese
• Published: 09.01.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

To provide an advantageous technique for controlling a substrate posture at high accuracy in scanning exposure of the substrate.SOLUTION: Exposure equipment which performs exposure of a substrate by moving a light irradiation area on the substrate while scanning the substrate includes: a first measurement part measuring sequentially each height of plural measurement object places arranged on the substrate along a scanning direction during the scan of the substrate before each measurement object place enters the light irradiation area; a second measurement part measuring sequentially the above each height during the substrate scanning before the measurement by the first measurement part is carried out; and a control part controlling the substrate posture during the above scan. The control part specifies abnormal places among plural measurement object places on the basis of the measurement result of each object place by the second measurement part, and controls the substrate posture without using the measurement result by the first measurement part in the abnormal places.SELECTED DRAWING: Figure 1 【課題】基板の走査露光において基板の姿勢を精度よく制御するために有利な技術を提供する。【解決手段】基板を走査しながら光照射領域を該基板上で移動させることにより該基板の露光を行う露光装置は、前記基板の走査中に、走査方向に沿って前記基板上に配列された複数の計測対象箇所の各々の高さを、各計測対象箇所が前記光照射領域に入る前に順次計測する第１計測部と、前記基板の走査中に、前記複数の計測対象箇所の各々の高さを、前記第１計測部での計測が行われる前に順次計測する第２計測部と、前記第１計測部での計測結果に基づいて、前記基板の走査中における前記基板の姿勢を制御する制御部と、を含み、前記制御部は、前記第２計測部による各計測対象箇所の計測結果に基づいて、前記複数の計測対象箇所の中から異常箇所を特定し、前記異常箇所における前記第１計測部での計測結果を用いずに前記基板の姿勢を制御する。【選択図】図１