SUBSTRATE PLACING BASE AND FILM DEPOSITION DEVICE

• Main Authors: TAKEI JUNICHI, IMOTO SHINJI, SUZUKI NAOYUKI, SONE HIROSHI
• Format: Patent
• Language: English; Japanese
• Published: 26.12.2019
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To provide a technology that can improve load bearing performance of a substrate placing base and improve positional accuracy for a substrate.SOLUTION: A substrate placing base includes: a shaft part arranged so as to be rotatable relative to a bottom surface of a treatment container; a base part provided on the shaft part; and a horizontal movement mechanism fitted to the base part and moving a substrate in a horizontal direction relative to the bottom surface inside the treatment container.SELECTED DRAWING: Figure 2 【課題】基板載置台の耐荷重性を向上させ、基板の位置精度を高めることができる技術を提供する。【解決手段】本開示の一態様による基板載置台は、処理容器の底面に対して回転可能に配設された軸部と、前記軸部上に設けられたベース部と、前記ベース部に取り付けられ、前記処理容器内で基板を前記底面に対して水平方向に移動させる水平移動機構と、を有する。【選択図】図２