COMPOUND, MANUFACTURING METHOD OF COMPOUND, AND COMPOSITION FOR ORGANIC FILM FORMATION

To provide a compound which is cured under a deposition condition not only in air, but also in inert gas, generates no by-product, and can form an organic underlay film not only excellent in heat resistance or impregnation or flattening property of pattern formed on a substrate, but also good in dry...

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Bibliographic Details
Main Authors WATANABE TAKESHI, DANIEL PAUL SANDERS, SAWAMURA TAKASHI, OGIWARA TSUTOMU, ARAIDA KEISUKE, GREGORY BREYTA, RUDY J WOJTECKI, NAGAI YOKO, ALEXANDER EDWARD HESS, TACHIBANA SEIICHIRO
Format Patent
LanguageEnglish
Japanese
Published 26.12.2019
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