RETAINER FOR PLURALITY OF SUBSTRATE PROCESSES AND PLURALITY OF SUBSTRATE HOUSING, PROCESSING FACILITY, AND PROCESSING METHOD

To provide a retainer for a plurality of substrate processes and a plurality of substrate housings, a processing facility, and a processing method.SOLUTION: A retainer 1 comprises: a flange having a carrier plate 11; and at least one segment 20 arranged in this flange. The flange includes a bonding...

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Bibliographic Details
Main Authors ANDREAS RACK, HARALD LIEPACK, SEBASTIAN WISSEL, MERZ THOMAS
Format Patent
LanguageEnglish
Japanese
Published 05.12.2019
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:To provide a retainer for a plurality of substrate processes and a plurality of substrate housings, a processing facility, and a processing method.SOLUTION: A retainer 1 comprises: a flange having a carrier plate 11; and at least one segment 20 arranged in this flange. The flange includes a bonding surface for arranging the segment 20 in this flange. The segment 20 has a segment carrier 13, and has at least one carrier 40 which is assembled to, and is assembled to the segment carrier, and is for one or a plurality of substrate housings.SELECTED DRAWING: Figure 1 【課題】複数の基体の処理のための、複数の基体の収容のための保持装置、処理設備、および、処理方法を提供する。【解決手段】保持装置１は、担持プレート１１を有するフランジと、このフランジに配置されている、少なくとも１つのセグメント２０とを備えている。フランジは、このフランジにおけるセグメント２０の配置のための、結合面を有する。セグメント２０が、セグメント担持体１３を有し、セグメント担持体に組み付けられている、１つまたは複数の基体の収容のための少なくとも１つのキャリアー４０を有する。【選択図】図１
Bibliography:Application Number: JP20190088367