ABERRATION MEASUREMENT METHOD AND ABERRATION MEASUREMENT DEVICE

• Main Author: FURUTA HIROKAZU
• Format: Patent
• Language: English; Japanese
• Published: 14.11.2019
• Subjects: MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; PHYSICS; TESTING; TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR

To provide an aberration measurement method and an aberration measurement device capable of performing stable aberration measurement by reducing the influence of a disturbance.SOLUTION: Two interference figures 6, 7 generated by a diffraction grating 117 and having different phases are detected simultaneously, and by detecting the phase modulation for a plurality of times simultaneously in the interference figures 6, 7, the measurement results of the plurality of pieces are obtained. On the same coordinate point in the interference figures 6, 7, performance of the phase modulation state based on image intensity change is detected. After switching to the different diffraction grating pattern, the same measurement and performance detection are performed. By evaluating all of these, the optical characteristic of the measurement optical component can be measured with high accuracy.SELECTED DRAWING: Figure 3 【課題】外乱の影響を低減し、安定した収差測定を行うことができる収差測定方法および収差測定装置を提供する。【解決手段】回折格子１１７により生成され、異なる位相を有する２つの干渉像６、７を同時に検出し、その干渉像内６，７で同時に複数回の位相変調を検出することで複数個の計測結果を出し、その干渉像内の６、７の同一座標点において、画像強度変化に基づく位相変調状態の性能を検出し、異なる回折格子パターンへ切り替え、同様の計測、性能検出を行い、これらを全てを評価することにより被計測光学部品の光学特性を高精度に計測することを可能にする。【選択図】図３