Y2O3-ZrO2 EROSION RESISTANT MATERIAL FOR CHAMBER COMPONENT IN PLASMA ENVIRONMENT

• Main Authors: DAVID FENWICK, SUN JENNIFER Y
• Format: Patent
• Language: English; Japanese
• Published: 07.11.2019
• Subjects: ARTIFICIAL STONE; BASIC ELECTRIC ELEMENTS; CEMENTS; CERAMICS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS; CONCRETE; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LIME, MAGNESIA; METALLURGY; REFRACTORIES; SEMICONDUCTOR DEVICES; SLAG; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TREATMENT OF NATURAL STONE

To provide a ceramic material capable of suppressing the corrosion of components in a processing chamber exposed to plasma using a corrosive gas.SOLUTION: A chamber component for processing chambers includes a ceramic body consisting of a sintered ceramic material substantially formed of YO-ZrOhaving one or more phases, and the ceramic material is substantially formed of YOof 55-65 mol% and ZrOof 35-45 mol%.SELECTED DRAWING: Figure 8 【課題】腐食性ガスを用いるプラズマに曝される処理チャンバ内の構成要素の腐食を抑制するセラミック材料の提供。【解決手段】処理チャンバ用のチャンバ構成要素は、１つ以上の相のＹ２Ｏ３−ＺｒＯ２から実質的に構成される焼結セラミック材料から成るセラミック体を含む。セラミック材料は５５〜６５ｍｏｌ％のＹ２Ｏ３及び３５〜４５ｍｏｌ％のＺｒＯ２から実質的に構成される。【選択図】図８