OXIDANT-CUM-DOPANT FOR MANUFACTURING CONDUCTIVE POLYMER AND SOLUTION THEREOF, CONDUCIVE POLYMER AND MANUFACTURING METHOD THEREFOR, AND ELECTROLYTIC CAPACITOR AND MANUFACTURING METHOD THEREFOR

To provide an electrolytic capacitor small in leakage current and low in ESR and a manufacturing method therefor, a conductive polymer capable of constituting the electrolytic capacitor and a manufacturing method therefor, an oxidant-cum-dopant for manufacturing the conductive polymer and a solution...

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Bibliographic Details
Main Authors SEKI EMI, TSURUMOTO YUHEI
Format Patent
LanguageEnglish
Japanese
Published 31.10.2019
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Summary:To provide an electrolytic capacitor small in leakage current and low in ESR and a manufacturing method therefor, a conductive polymer capable of constituting the electrolytic capacitor and a manufacturing method therefor, an oxidant-cum-dopant for manufacturing the conductive polymer and a solution thereof.SOLUTION: The oxidant-cum-dopant for manufacturing a conductive polymer contains (a) at least one kind selected from the group consisting of benzene sulfonic acid containing a specific hydrocarbon group, and naphthalenesulfonic acid containing a specific hydrocarbon group, or a ferric salt thereof, and (b) naphthalenesulfonic acid or a ferric acid thereof, at least a part of the (a) and the (b) is a ferric salt, content of the (a) is 1 to 50 pts.mass based on 100 pts.mass of the (b) content. The oxidant-cum-dopant solution for manufacturing the conductive polymer is prepared by dissolving the oxidant and the dopant for manufacturing the conductive polymer in a solvent.SELECTED DRAWING: None 【課題】 漏れ電流が小さく、かつESRが低い電解コンデンサおよびその製造方法、前記電解コンデンサを構成し得る導電性高分子およびその製造方法、並びに前記導電性高分子を製造するための酸化剤兼ドーパントおよびその溶液を提供する。【解決手段】 本発明の導電性高分子製造用酸化剤兼ドーパントは、(a)特定の炭化水素基を含有するベンゼンスルホン酸、および特定の炭化水素基を含有するナフタレンスルホン酸よりなる群から選ばれる少なくとも1種またはその第二鉄塩、並びに(b)ナフタレンスルホン酸またはその第二鉄塩を含有し、かつ前記(a)および前記(b)の少なくとも一部は第二鉄塩であり、前記(b)の含有量を100質量部としたときの前記(a)の含有量が、1〜50質量部である。本発明の導電性高分子製造用酸化剤兼ドーパント溶液は、本発明の導電性高分子製造用酸化剤兼ドーパントが溶媒に溶解してなるものである。【選択図】 なし
Bibliography:Application Number: JP20180086006