EPITAXY PROCESS SYSTEM COMPRISING AUTOMATIC CONVEYANCE SYSTEM, AND AUTOMATIC CONVEYANCE METHOD OF THE SAME
To provide an epitaxy process system comprising an automatic conveyance system and an automatic conveyance method thereof.SOLUTION: In an epitaxy process system comprising an automatic conveyance system and an automatic conveyance method thereof according to the present invention, the epitaxy proces...
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Main Authors | , , , , |
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Format | Patent |
Language | English Japanese |
Published |
24.10.2019
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Subjects | |
Online Access | Get full text |
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Summary: | To provide an epitaxy process system comprising an automatic conveyance system and an automatic conveyance method thereof.SOLUTION: In an epitaxy process system comprising an automatic conveyance system and an automatic conveyance method thereof according to the present invention, the epitaxy process system is provided with a reaction module, a conveyance module, and a load lock module, and the conveyance module and the load lock module severally has two temporary storage mechanisms. A susceptor on which a wafer which has not undergone epitaxial reaction is mounted is moved from one of the two temporary storage mechanisms of the load lock module or a temporary storage mechanism of the conveyance module to a reaction cavity part of the reaction module, and epitaxial reaction is performed in combination with a ceiling. Thus, the conveyance module performs automatic conveyance of the susceptor and the ceiling between the reaction module, the conveyance module and the load lock module.SELECTED DRAWING: Figure 4
【課題】自動搬送システムを具備するエピタキシープロセスシステム及びその自動搬送方法を提供する。【解決手段】本発明の自動搬送システムを具備するエピタキシープロセスシステム及びその自動搬送方法は、エピタキシープロセスシステムは反応モジュール、搬送モジュール、及びロードロックモジュールが提供され、搬送モジュール及びロードロックモジュールは2つの仮貯蔵機構をそれぞれ有する。エピタキシャル反応を経ていないウェハーが載置されるサセプタが、ロードロックモジュールの2つの仮貯蔵機構の1つまたは前記搬送モジュールの仮貯蔵機構から反応モジュールの反応キャビティ箇所に移動され、天井と組み合わせられてエピタキシャル反応が行われる。これにより、搬送モジュールが反応モジュール、搬送モジュール、及びロードロックモジュールの間でサセプタ及び天井の自動搬送を行う。【選択図】図4 |
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Bibliography: | Application Number: JP20190056478 |