MANUFACTURING METHOD OF ELECTROSTATIC CHUCK DEVICE

To provide a method of manufacturing an electrostatic chuck device in which generation of particles is suppressed.SOLUTION: The method of manufacturing an electrostatic chuck device 1 for electrostatically attracting a plate-like sample to one main surface of a substrate made of a dielectric materia...

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Bibliographic Details
Main Authors HIDAKA NOBUHIRO, KIMURA NAOTO, KOSAKAI MAMORU
Format Patent
LanguageEnglish
Japanese
Published 17.10.2019
Subjects
BASIC ELECTRIC ELEMENTS
CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GENERATION
SEMICONDUCTOR DEVICES
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Summary:To provide a method of manufacturing an electrostatic chuck device in which generation of particles is suppressed.SOLUTION: The method of manufacturing an electrostatic chuck device 1 for electrostatically attracting a plate-like sample to one main surface of a substrate made of a dielectric material includes steps of: blasting a base material made of a dielectric material; heat-treating at least a blasted surface; and forming the substrate having a plurality of protrusions on the one main surface.SELECTED DRAWING: Figure 2C 【課題】パーティクルの発生が抑制された静電チャック装置の製造方法を提供する。【解決手段】誘電体材料を形成材料とする基体の一主面に板状試料を静電吸着する静電チャック装置１の製造方法であって、誘電体材料を形成材料とする基材をブラスト加工した後に、少なくともブラスト加工した面を熱処理し、一主面に複数の突起部を有した基体を形成する工程を有する。【選択図】図２Ｃ
Bibliography:Application Number: JP20180066503