QUALITY CONTROL METHOD OF POSITION MEASUREMENT LIGHT SOURCE, AND SEMICONDUCTOR MANUFACTURING APPARATUS

• Main Authors: TOJIMA MIKI, MURAKAMI SADATOSHI
• Format: Patent
• Language: English; Japanese
• Published: 03.10.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide a quality control method of a position measurement light source and a semiconductor manufacturing apparatus that are capable of evaluating characteristics of the position measurement light source.SOLUTION: A quality control method of a position measurement light source includes: irradiati...