QUALITY CONTROL METHOD OF POSITION MEASUREMENT LIGHT SOURCE, AND SEMICONDUCTOR MANUFACTURING APPARATUS

• Main Authors: TOJIMA MIKI, MURAKAMI SADATOSHI
• Format: Patent
• Language: English; Japanese
• Published: 03.10.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide a quality control method of a position measurement light source and a semiconductor manufacturing apparatus that are capable of evaluating characteristics of the position measurement light source.SOLUTION: A quality control method of a position measurement light source includes: irradiating light of the position measurement light source on multiple marks having different heights; measuring a relationship between the height of each mark and intensity of light reflected by the mark; and identifying a wavelength of the position measurement light source by comparing measurement data acquired by the measurement to reference data representing a relationship between the height of the mark and intensity of the reflected light for each of multiple wavelengths.SELECTED DRAWING: Figure 4 【課題】位置計測用光源の特性を評価することができる位置計測用光源の品質管理方法および半導体製造装置を提供する。【解決手段】位置計測用光源の品質管理方法によれば、高さの異なる複数のマークに位置計測用光源の光を照射して、前記マークの高さと、前記マークで反射した光の強度との関係を計測し、前記計測により取得した計測データを、前記マークの高さと、複数の波長ごとの反射光の強度との関係を表す参照データに照合し、前記位置計測用光源の波長を特定する。【選択図】図４