Co-Ni-BASED ALLOY DIAPHRAGM AND METHOD FOR PRODUCING THE SAME

• Main Authors: KAMATA TAKASHI, SATO HIDETOMO
• Format: Patent
• Language: English; Japanese
• Published: 26.09.2019
• Subjects: ALLOYS; BLASTING; CHEMISTRY; CYLINDERS; ENGINEERING ELEMENTS AND UNITS; FERROUS OR NON-FERROUS ALLOYS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS; HEATING; LIGHTING; MECHANICAL ENGINEERING; METALLURGY; PISTONS; SEALINGS; THERMAL INSULATION IN GENERAL; TREATMENT OF ALLOYS OR NON-FERROUS METALS; WEAPONS

To provide a metal diaphragm that can improve chemical stability of a semiconductor process used herein and is suitable for valves or the like and a method of producing the same.SOLUTION: A Co-Ni-based alloy diaphragm has a composition consisting of Co: 30 mass% or more and 40 mass% or less, Ni: 27 mass% or more and 36 mass% or less, Cr: 12 mass% or more and 26 mass% or less, Mo: 8 mass% or more and 13 mass% or less, Nb: 0.5 mass% or more and 3 mass% or less, Ti: 0.01 mass% or less, with the balance being unavoidable impurities, and has a tensile strength of 1470 MPa or more, an elongation of 1.5% or more and a hardness of 500±30 Hv.SELECTED DRAWING: Figure 1 【課題】本発明は、用いられる半導体プロセスの化学的安定性を高めることのできるバルブ用などとして好適なメタルダイヤフラムおよびその製造方法を提供することを課題とする。【解決手段】本発明のＣｏ−Ｎｉ基合金ダイヤフラムは、Ｃｏ：３０質量％以上４０質量％以下、Ｎｉ：２７質量％以上３６質量％以下、Ｃｒ：１２質量％以上２６質量％以下、Ｍｏ：８質量％以上１３質量％以下、Ｎｂ：０．５質量％以上３質量％以下、Ｔｉ：０．０１質量％以下、残部不可避不純物の組成を有し、引張強度が１４７０ＭＰａ以上、伸びが１．５％以上、硬さが５００±３０Ｈｖであることを特徴とする。【選択図】図１