Fe-Pt-OXIDE-BN-BASED SINTERED BODY FOR SPUTTERING TARGET

• Main Authors: YAMAMOTO TAKAMITSU, KOBAYASHI HIRONORI, MIYASHITA TAKASHI, KUROSE KENTA, NISHIURA MASAHIRO
• Format: Patent
• Language: English; Japanese
• Published: 26.09.2019
• Subjects: ALLOYS; CASTING; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; FERROUS OR NON-FERROUS ALLOYS; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MAKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; METALLURGY; PERFORMING OPERATIONS; PHYSICS; POWDER METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING; TREATMENT OF ALLOYS OR NON-FERROUS METALS; WORKING METALLIC POWDER

To provide a high density Fe-Pt-oxide-BN-based sintered body for a sputtering target capable of suppressing particle generation at a sputtering time.SOLUTION: There is provided a Fe-Pt-oxide-BN-based sintered body for a sputtering target in which a mass ratio N/B of N to B is in the range of 1.30±0.1.SELECTED DRAWING: None 【課題】スパッタリング時のパーティクル発生を抑制できる高密度のスパッタリングターゲット用Ｆｅ−Ｐｔ−酸化物−ＢＮ系焼結体を提供する。【解決手段】Ｂに対するＮの質量比Ｎ／Ｂが１．３０±０．１の範囲にあるスパッタリングターゲット用Ｆｅ−Ｐｔ−酸化物−ＢＮ系焼結体。【選択図】なし