COMPOSITION FOR FORMING RELEASING LAYER

• Main Authors: SHINDO KAZUYA, EBARA KAZUYA, KOIDE YASUYUKI
• Format: Patent
• Language: English; Japanese
• Published: 29.08.2019
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; CORRECTING FLUIDS; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FILLING PASTES; INKS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; SEMICONDUCTOR DEVICES; USE OF MATERIALS THEREFOR; WOODSTAINS

To provide a composition for forming a releasing layer that prevents separation from a glass substrate, and enables easy separation of a layer on a releasing layer from the top of it.SOLUTION: A composition for forming a releasing layer contains a polyamic acid containing 50% by mole or more of a monomer unit of formula (1) and having a weight average molecular weight of 10,000 or more, and an organic solvent. In formula (1), Xrepresents a tetravalent organic group; and Yrepresents a divalent group represented by formula (P).SELECTED DRAWING: None 【課題】ガラス基板との剥離が生じず、さらに剥離層上の層を剥離できる剥離層形成用組成物の提供。【解決手段】式（１）のモノマー単位を５０モル％以上含み、重量平均分子量が１０，０００以上のポリアミック酸と、有機溶媒とを含む、剥離層形成用組成物。式（１）において、Ｘ１は、４価の有機基を表し、Ｙ１は、下記の式（Ｐ）で表される２価の基を表す。【選択図】なし