PROCESSING METHOD

• Main Authors: KATORI SHIGETAKA, IGAWA TAKUTO, SHINOHE TAKASHI
• Format: Patent
• Language: English; Japanese
• Published: 22.07.2019
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To provide a new processing method capable of processing a substrate well and stably even when a material hardly atomized or hardly forming droplets is applied.SOLUTION: A processing method of a substrate includes an atomizing/droplet-forming step for producing mist or droplets 4b by atomizing or dr...