GAS BARRIER FILM

To provide a gas barrier film excellent in temperature and humidity resistance.SOLUTION: A gas barrier film is obtained by forming, at least on one side of a substrate, an inorganic oxide layer and a photopolymerizable composition layer in this order. The photopolymerizable composition layer is form...

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Bibliographic Details
Main Authors AMANO AKIKO, NASU SHINTARO, SAWADA MASANORI, SHIODA SATOSHI, KUSHIBE KEISUKE
Format Patent
LanguageEnglish
Japanese
Published 22.07.2019
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Summary:To provide a gas barrier film excellent in temperature and humidity resistance.SOLUTION: A gas barrier film is obtained by forming, at least on one side of a substrate, an inorganic oxide layer and a photopolymerizable composition layer in this order. The photopolymerizable composition layer is formed with a resin obtained by polymerizing a photopolymerizable composition containing: (a) a polyvalent metal salt of a carboxylic acid compound having an unsaturated double bond; and (b) a compound having an unsaturated double bond other than (a). A ratio (A/A) is 0.01 or more, and less than 1.2, with regard to an absorbancy A according to νC=O of a carboxylate ion in a vicinity of 1560 cmand an absorbancy Aaccording to νC=O of a carboxylic acid group in a vicinity of 1700 cm, in an infrared absorption spectrum of the photopolymerizable composition layer.SELECTED DRAWING: Figure 1 【課題】 耐熱耐湿性に優れたガスバリアフィルムを提供する。【解決手段】 基材の少なくとも片面に無機酸化物層、光重合性組成物層をこの順に形成して得られるガスバリアフィルムであって、前記光重合性組成物層は、(a)不飽和二重結合を有するカルボン酸化合物の多価金属塩と、(b)(a)以外の不飽和二重結合を有する化合物とを含有する光重合性組成物を重合して得られる樹脂により形成され、そして、前記光重合性組成物層の赤外線吸収スペクトルにおける1560cm-1付近のカルボキシレートイオンのνC=Oに基づく吸光度Aと1700cm-1付近のカルボン酸基のνC=Oに基づく吸光度A0との比(A/A0)が、0.01以上、1.2未満である、前記ガスバリアフィルムを提供する。【選択図】 図1
Bibliography:Application Number: JP20170253273