TRANSPARENT VAPOR-DEPOSITED FILM

To provide a high adhesion transparent vapor-deposited film capable of being produced at high deposition rate, excellent in uniformity, excellent in adhesiveness with a plastic substrate and a vapor-deposited film, and capable of exhibiting heat barrier resistance, wet barrier resistance, and long t...

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Main Authors MIYAMA HIROSHI, MATSUZAKI HIROSHI, ASUKAMA TATSUO, MIYAZAKI KAORU, KOMURA TERUHISA, GOTO TAKAKAZU, MATSUI SHIGEKI
Format Patent
LanguageEnglish
Japanese
Published 11.07.2019
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Summary:To provide a high adhesion transparent vapor-deposited film capable of being produced at high deposition rate, excellent in uniformity, excellent in adhesiveness with a plastic substrate and a vapor-deposited film, and capable of exhibiting heat barrier resistance, wet barrier resistance, and long term storage stability.SOLUTION: By employing a roller type continuous vapor-deposited membrane forming devices which separate a pre-treatment section equipped with a plasma pre-treatment device, and a deposition section and are arranged in series, a substrate transferred at high speed is supplied to a substrate surface side at a state that plasma is set at electrically positive potential in a gap surrounding by a pre-treatment roller and a magnet which is plasma supply means for supplying a plasma forming gas and magnetic formation means by plasma pre-treatment means for supplying plasma to the substrate to form a pre-treatment surface which is active on the surface of the substrate, and immediately inorganic oxide vapor-deposited membranes mainly containing aluminum oxide containing an Al-C covalent bond continuously on a pre-treated surface of the substrate is deposited at high speed to manufacture a high adhesion transparent vapor-deposited film.SELECTED DRAWING: None 【課題】高速な成膜速度で生産でき、均一性に優れ、プラスチック基材と蒸着膜との密着性に優れた、耐熱性バリア性能、及び、耐湿性バリア性能、長期保存安定性等を発揮できる、高密着性透明蒸着フィルムの提供。【解決手段】プラズマ前処理装置を設けた前処理区画と、成膜区画を隔離し、直列に併設されたローラー式連続蒸着膜成膜装置を採用して、高速搬送される基材を、前処理ローラーと、プラズマ形成ガスを供給するプラズマ供給手段及び磁気形成手段であるマグネットとで囲まれた空隙内に、基材に向けてプラズマを供給するプラズマ前処理手段により、プラズマを電気的に正電位に設定した状態で、基材表面側に供給し、基材の表面に活性のある前処理表面を形成し、直ちに基材の前処理面に連続してAL−Cの共有結合を含む酸化アルミニウムを主成分とする無機酸化物蒸着膜を高速で成膜し、高密着性透明蒸着フィルムとする。【選択図】なし
Bibliography:Application Number: JP20190027054