THIN-FILM TRANSISTOR, METHOD FOR MANUFACTURING THE SAME, AND DISPLAY INCLUDING THE SAME

To provide a thin-film transistor that can alleviate the occurrence of electric field concentration in an oxide semiconductor layer during the drive of the thin-film transistor, so as to prevent partial degradation of the oxide semiconductor layer.SOLUTION: A thin-film transistor 100 is a thin-film...

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Bibliographic Details
Main Author JANG JAEMAN
Format Patent
LanguageEnglish
Japanese
Published 04.07.2019
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Summary:To provide a thin-film transistor that can alleviate the occurrence of electric field concentration in an oxide semiconductor layer during the drive of the thin-film transistor, so as to prevent partial degradation of the oxide semiconductor layer.SOLUTION: A thin-film transistor 100 is a thin-film transistor including an oxide semiconductor layer 130 on a substrate 110, and the oxide semiconductor layer includes a channel part 131, a first channel connection part 132 connected to a first terminal part 131A of the channel part, and a second channel connection part 133 connected to a second terminal part 131B of the channel part. The thickness of the second channel connection part is different from the thickness of the first channel connection part. The first terminal part of the channel part has the same thickness as that of the first channel connection part, and the second terminal part of the channel part has the same thickness as that of the second channel connection part.SELECTED DRAWING: Figure 1 【課題】薄膜トランジスタの駆動時の酸化物半導体層で電界集中が発生することを緩和して、酸化物半導体層の部分的な劣化を防止することができる薄膜トランジスタを提供する。【解決手段】薄膜トランジスタ100は、基板110上の酸化物半導体層130を含む薄膜トランジスタであって、酸化物半導体層は、チャネル部131、チャネル部の第1末端部131Aと接続した第1チャネル接続部132およびチャネル部の第2末端部131Bと接続した第2チャネル接続部133を含む。第2チャネル接続部の厚さは、第1チャネル接続部の厚さと異なる。チャネル部の第1末端部は、第1チャネル接続部と同じ厚さを有し、チャネル部の第2末端部は、第2チャネル接続部と同じ厚さを有する。【選択図】図1
Bibliography:Application Number: JP20180227777