METHOD FOR DIRECTED SELF-ASSEMBLY IN TARGET DESIGN AND PRODUCTION

• Main Authors: ITZKOVICH TAL, VOLKOVICH ROIE, AMIR NURIEL, CHOI DONGSUB, AMIT ERAN, RAVIV YOHANAN
• Format: Patent
• Language: English; Japanese
• Published: 27.06.2019
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMISTRY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide a use of a directed self-assembly (DSA) process for target design and production, with focus on overlay target design and metrology.SOLUTION: A method comprises producing a metrology target by a directed self-assembly (DSA) process, where at least one target element of the target is distinguished from a background associated with the at least one target element by at least one characteristic of the DSA process. The at least one characteristic of the DSA process is configured to provide an optical distinction between the at least one target element and the background associated with the at least one target element. The method further comprises measuring the optical distinction.SELECTED DRAWING: Figure 1 【課題】オーバーレイ標的設計及び計測に焦点を当てて標的設計及び製造のために誘導自己組織化（ＤＳＡ）プロセスを使用する。【解決手段】計測標的を、誘導自己組織化（ＤＳＡ）プロセスによって製造することを含む方法であって、標的のうちの少なくとも１つの標的要素が、ＤＳＡプロセスのうちの少なくとも１つの特徴によって、少なくとも１つの標的要素に関連する背景と区別される。ＤＳＡプロセスの少なくとも１つの特徴が、少なくとも１つの標的要素と少なくとも１つの標的要素に関連する背景との間に光学的区別を提供するように構成され、光学的区別を測定することをさらに含む。【選択図】図１