SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING APPARATUS CONTROL METHOD AND STORAGE MEDIUM STORING PROGRAM

• Main Authors: YAMAKAWA SUMIYASU, TSUSHIMA TAKUYA
• Format: Patent
• Language: English; Japanese
• Published: 27.06.2019
• Subjects: APPARATUS THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROFORMING; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; METALLURGY; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS; SEMICONDUCTOR DEVICES

To improve positioning performance of a substrate.SOLUTION: A substrate processing apparatus for processing a substrate comprises: an image sensor for detecting positions of two corners on at least one diagonal of the substrate when the substrate is transferred to a predetermined position; a lighting device capable of being arranged on the side opposite to the image sensor with respect to the substrate lying on the predetermined position to illuminate the two corners of the substrate; and a control device for determining the position of the substrate based on the positions of the two corners detected by the image sensor, in which the control device is constituted to make it possible to change at least one of light intensity and wavelength of output light of the lighting device.SELECTED DRAWING: Figure 15A 【課題】基板の位置決めを向上させることにある。【解決手段】基板を処理するための基板処理装置であって、基板が所定の位置に搬送されたときに、前記基板の少なくとも１つの対角線上の２つの隅部の位置を検出する画像センサと、 前記所定の位置にある前記基板に対して前記画像センサとは反対側において、前記基板の前記２つの隅部を照射するように配置可能である照明装置と、 前記画像センサで検出された前記２つの隅部の位置に基づいて前記基板の位置を判定する制御装置と、を備え、 前記制御装置は、前記照明装置の出力光の光量及び波長の少なくとも１つを変更することが可能に構成されている、基板処理装置。【選択図】図１５Ａ