JOINED SUBSTRATE AND PRODUCTION METHOD OF JOINED SUBSTRATE
To provide a joined substrate mainly for a power semiconductor package, having improved reliability toward thermal shock cycle than conventional ones.SOLUTION: The joined substrate 10B contains a nitride ceramic substrate 1 having on one or both principal planes joined with a copper plate 3, wherein...
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Main Authors | , , , |
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Format | Patent |
Language | English Japanese |
Published |
27.06.2019
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a joined substrate mainly for a power semiconductor package, having improved reliability toward thermal shock cycle than conventional ones.SOLUTION: The joined substrate 10B contains a nitride ceramic substrate 1 having on one or both principal planes joined with a copper plate 3, wherein a joint layer 2 containing TiN is provided between the nitride ceramic substrate 1 and the copper plate 3 and is neighboring at least with the copper plate, and an Ag distribution area 3d where Ag atoms are distributed in the copper plate exists. Preferably, Ag rich phases 5 discretely exist at an interface I2 of the joint layer 2 and the copper plate 3.SELECTED DRAWING: Figure 3
【課題】従来よりも冷熱サイクルに対する信頼性を高めた、主としてパワー半導体実装用の接合基板の提供。【解決手段】窒化物セラミックス基板1の一方もしくは両方の主面に銅板3が接合されてなる接合基板10Bにおいて、TiNを含む接合層2が窒化物セラミックス基板1と銅板3との間に介在するとともに少なくとも前記銅板と隣接し、銅板内にAg原子が分布してなるAg分布領域3dが存在するようにする。好ましくは、接合層2と銅板3との界面I2にAgリッチ相5が離散的に存在するようにする。【選択図】図3 |
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Bibliography: | Application Number: JP20190020642 |