METHOD OF SELECTIVE DEPOSITION TO FORM FULLY SELF-ALIGNED VIA
To provide a method for selective membrane deposition.SOLUTION: A method includes a step of providing a substrate 1 including a metal layer 104 having a dielectric materials 100 and 101 and a metal oxide layer 107 thereon, a step of coating the substrate with a metal-containing catalyst layer 105, a...
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Main Author | |
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Format | Patent |
Language | English Japanese |
Published |
20.06.2019
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Subjects | |
Online Access | Get full text |
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