EXPOSURE APPARATUS

• Main Author: MURAKAMI SHIGEO
• Format: Patent
• Language: English; Japanese
• Published: 13.06.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide a projection type exposure apparatus which can irradiate an exposure pattern to a lateral face of a three-dimensional exposure object only by adding opening contraction outside an axis to an illumination optical system of an existing exposure apparatus without inclining the exposure object, and freely process a lateral face at an arbitrary angle including perpendicularity.SOLUTION: In an exposure apparatus for exposing a lateral face 103a of an exposure object 103, an illumination system opening contraction 33 is installed outside an optical axis, and a light flux directing from an illumination optical system to a mask 20 has an inclination angle and becomes inclined illumination. A diffracting light having an inclination angle is generated from an irradiated mask pattern 23, and is taken in a projection optical system 50, and a pattern image is transferred to the lateral face 103a of the exposure object 103 by a light flux condensed from the projection optical system 50.SELECTED DRAWING: Figure 5 【課題】 露光対象物を傾斜させることなく、既存の露光装置の照明光学系に軸外の開口絞りを追加するだけで、立体的露光対象物の側面に露光パターンを照射することができ、垂直を含む任意角度の側面を自由に加工することが可能な投影型露光装置を提供する。【解決手段】 露光対象物１０３の側面１０３ａを露光するための露光装置であって、照明系開口絞り３３が光軸外に設置され、照明光学系からマスク２０へ向かう光束は傾斜角度を有し、傾斜照明となる。照射されたマスクパターン２３からは傾斜角度を有る回折光が発生し、投影光学系５０に取り込まれ、投影光学系５０からの集光した光束により露光対象物１０３の側面１０３ａにパターン像が転写される。【選択図】 図５