COATED FILM FORMING DEVICE AND SYSTEM OF MANUFACTURING SEMICONDUCTOR DEVICE

• Main Authors: ENOMOTO MASASHI, SHIMURA SATORU
• Format: Patent
• Language: English; Japanese
• Published: 25.04.2019
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

To form a pattern with high uniformity inside a surface of a substrate including an end of the substrate.SOLUTION: A coated film forming device comprises a plurality of processing modules including: a coating module 3B for an undercoated film for forming the undercoated film by coating a substrate W...