PHOTORESIST STRIPPING SOLUTION

To provide a photoresist stripping solution excellent in resist stripping property and anticorrosion property on a metal surface.SOLUTION: The photoresist stripping solution comprises (a) an alkaline metal hydroxide, (b) an organic solvent containing at least one compound selected from the group con...

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Bibliographic Details
Main Authors TAKEI MIZUKI, NISHIJIMA YOSHITAKA, YOSHIZAKI SATORU
Format Patent
LanguageEnglish
Japanese
Published 25.04.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:To provide a photoresist stripping solution excellent in resist stripping property and anticorrosion property on a metal surface.SOLUTION: The photoresist stripping solution comprises (a) an alkaline metal hydroxide, (b) an organic solvent containing at least one compound selected from the group consisting of ethylene glycol and tetrahydrofurfuryl alcohol, (c) hydroxyl amines, and (d) water.SELECTED DRAWING: None 【課題】レジスト剥離性および金属表面の防食性に優れたフォトレジスト剥離液を提供する。【解決手段】（ａ）アルカリ金属水酸化物、（ｂ）エチレングリコールおよびテトラヒドロフルフリルアルコールからなる群より選択される少なくとも１種を含む有機溶媒、（ｃ）ヒドロキシルアミン類、および（ｄ）水を含むフォトレジスト剥離液。【選択図】なし
Bibliography:Application Number: JP20170193559