PHOTOACID GENERATORS

• Main Authors: PAUL J LABEAUME, ONGAYI OWENDI, THACKERAY JAMES W, JAIN VIPUL, COLEY SUZANNE M, AHMAD E MADKOUR, CAMERON JAMES F
• Format: Patent
• Language: English; Japanese
• Published: 18.04.2019
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide photoacid generator compounds that do not yield decomposition products that cover and corrode optics, in chemically amplified photoresists for microelectronics applications.SOLUTION: A photoacid generator compound has a compound being a cation of a structure represented by a formula (V) a...