PHOTOACID GENERATORS

• Main Authors: PAUL J LABEAUME, ONGAYI OWENDI, THACKERAY JAMES W, JAIN VIPUL, COLEY SUZANNE M, AHMAD E MADKOUR, CAMERON JAMES F
• Format: Patent
• Language: English; Japanese
• Published: 18.04.2019
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide photoacid generator compounds that do not yield decomposition products that cover and corrode optics, in chemically amplified photoresists for microelectronics applications.SOLUTION: A photoacid generator compound has a compound being a cation of a structure represented by a formula (V) and forming a pair with an anion such as a sulfonic acid or sulfonamide. (X is S or I; and one of Arand Aris a Cfused polycyclic aryl group and the other is a singly bonded polycyclic aryl group.)SELECTED DRAWING: None 【課題】マイクロエレクトロニクス用途の為の化学増幅型フォトレジストにおいて、光学素子を覆い、腐蝕する様な分解生成物を生じない光酸発生剤化合物の提供。【解決手段】式（Ｖ）で表わされる構造のカチオンであり、スルホン酸又はスルホンアミド等のアニオンと対を形成する化合物を有する光酸発生剤化合物。（ＸはＳ又はＩ；Ａｒ１及びＡｒ２の一方はＣ１０−３０縮合多環式アリール基、他方は単結合多環式アリール基）【選択図】なし