PLASMA PROCESSING APPARATUS

• Main Authors: KUWABARA YUICHI, TAWARAYA SHUNTARO, SUN LIANG, SATO RYOHEI
• Format: Patent
• Language: English; Japanese
• Published: 04.04.2019
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To provide a plasma processing apparatus capable of generating stable plasma.SOLUTION: A plasma processing apparatus comprises: a processing container; an upper structure which is arranged above the processing container so as to generate plasma in a lower region thereof; a structure holding ring R which is fixed around the upper structure; and a vertically movable arm AM which supports the ring. The plasma processing apparatus further comprises: screws C (including bolts) which are fixed to one of the ring R and the arm AM so that tips thereof come into contact with the other one of the ring R and the arm AM; and pins D, each inserted through a hole, which are provided on the ring or the arm so as to restrict horizontal movement of the ring R.SELECTED DRAWING: Figure 9 【課題】安定したプラズマを発生可能なプラズマ処理装置を提供する。【解決手段】処理容器と、処理容器の上部に設けられ、その下部領域にプラズマを発生させる上部構造体と、上部構造体の周囲に固定された構造体保持用のリングＲと、リングを支持し上下に移動可能なアームＡＭとを備え、リングＲ及びアームＡＭの一方に固定され、先端部が他方に当接するネジＣ（ボルト含む）と、リング又はアームに設けられ、リングＲの水平方向の移動を規制する孔を通るピンＤとを備えている。【選択図】図９