CONTROL SYSTEM, ABNORMALITY DETECTION METHOD, AND ABNORMALITY DETECTION PROGRAM

• Main Authors: FUJIWARA TETSUO, ITO MASAHIKO, SUZUKI SHUSUKE
• Format: Patent
• Language: English; Japanese
• Published: 04.04.2019
• Subjects: BASIC ELECTRIC ELEMENTS; CONTROL OR REGULATING SYSTEMS IN GENERAL; CONTROLLING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS; PHYSICS; REGULATING; SEMICONDUCTOR DEVICES

To provide a technology capable of detecting an abnormality in a manufacturing process which could not be detected conventionally.SOLUTION: A control system (100) includes; a sensor (120) that measures process parameters in a manufacturing process and outputs multiple sensor values; a regulator (140) for adjusting process parameters; a control device (130) for outputting a control signal for controlling an adjustment device such that the sensor value matches the predetermined target value; and an abnormality detection unit (132) that detects an abnormality in the control system when there is no change in the sensor value.SELECTED DRAWING: Figure 1 【課題】従来検知できなかった製造プロセスにおける異常を検知できる技術を提供すること。【解決手段】制御システム（１００）は、製造プロセスにおけるプロセスパラメータを測定して複数のセンサ値を出力するセンサ（１２０）と、プロセスパラメータを調節するための調節装置（１４０）と、センサ値が予め定められた目標値に一致するように調節装置を制御するための制御信号を出力する制御装置（１３０）と、センサ値の変動がない場合に制御システムの異常を検知する異常検知部（１３２）とを備える。【選択図】図１