PLASMA GAS IRRADIATION DEVICE

• Main Authors: SHINDO TAKAHIRO, IKEDO TOSHIYUKI
• Format: Patent
• Language: English; Japanese
• Published: 28.03.2019
• Subjects: ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS

To improve a plasma gas irradiation device.SOLUTION: A plasma gas irradiation device comprises: an upstream-side housing which includes a discharge space and in which plasma gas is generated; a downstream-side housing which is provided attachably to and detachably from the upstream-side housing and includes one or more plasma gas injection holes communicable with the discharge space; and a cover part which is provided attachably to and detachably from the upstream-side housing or the downstream-side housing and covers the downstream-side housing with a clearance gap interposed therebetween. The plasma gas is injected from an opening of the cover part and a processed object is irradiated with the plasma gas. Thus, since the downstream-side housing is provided attachably to and detachably from the upstream-side housing and the cover part is provided attachably to and detachably from the upstream-side housing or the downstream-side housing, the plasma irradiation device can be improved.SELECTED DRAWING: Figure 4 【課題】本発明の課題は、プラズマガス照射装置の改良である。【解決手段】本発明に係るプラズマガス照射装置は、放電空間を備え、プラズマガスが生成される上流側ハウジングと、前記上流側ハウジングに着脱可能に設けられ、前記放電空間に連通可能な１つ以上のプラズマガス噴出口を備えた下流側ハウジングと、前記上流側ハウジングまたは下流側ハウジングに着脱可能に設けられ、前記下流側ハウジングを隙間を隔てて覆うカバー部とを含み、前記カバー部の開口から前記プラズマガスが噴出させられて被処理物に照射される。このように、下流側ハウジングを上流側ハウジングに着脱可能に設け、カバー部を上流側ハウジングまたは下流側ハウジングに着脱可能に設けたのであり、それにより、プラズマ照射装置を改良することができる。【選択図】図４