ACID GENERATORS AND PHOTORESISTS COMPRISING THAT GENERATORS

• Main Authors: PAUL J LABEAUME, JAMES W THACKERAY, JAMES F CAMERON
• Format: Patent
• Language: English; Japanese
• Published: 28.03.2019
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; DYES; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PAINTS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES

To provide acid generator compounds that are particularly useful as a photoresist composition component.SOLUTION: In one preferred aspect, a photoresist composition is provided comprising: (i) a polymer; (ii) a first onium salt acid generator that produces a first acid upon exposure of the photoresist composition to activating radiation; and (iii) a second onium salt acid generator that (1) comprises a covalently bound acid-labile moiety and (2) produces a second acid upon exposure of the photoresist composition to activating radiation, where the first acid and second acid have pKa values that differ by at least 0.5.SELECTED DRAWING: None 【課題】フォトレジスト組成物成分として特に有用な酸発生剤化合物を提供する。【解決手段】１つの好ましい態様では、（ｉ）ポリマーと；（ｉｉ）フォトレジスト組成物が活性化放射線に露光すると第１の酸を生成する第１のオニウム塩酸発生剤と；（ｉｉｉ）（１）共有結合した酸不安定性部分を含み、（２）フォトレジスト組成物が活性化放射線に露光すると第２の酸を生成する、第２のオニウム塩酸発生剤と；を含むフォトレジストであって、前記第１の酸および前記第２の酸は少なくとも０．５異なるｐＫａ値を有する、フォトレジスト組成物。【選択図】なし