SEMICONDUCTOR DEVICE, SEMICONDUCTOR SYSTEM, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE

To provide a semiconductor device, a semiconductor system, and a manufacturing method for semiconductor device capable of precisely monitoring a minimum operation voltage of a target circuit to be monitored.SOLUTION: According to an embodiment, a monitor unit of a semiconductor system SYS1, driven b...

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Bibliographic Details
Main Authors FUKUOKA KAZUKI, UEMURA TOSHIFUMI, KITAJI YUKO
Format Patent
LanguageEnglish
Japanese
Published 22.03.2019
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Summary:To provide a semiconductor device, a semiconductor system, and a manufacturing method for semiconductor device capable of precisely monitoring a minimum operation voltage of a target circuit to be monitored.SOLUTION: According to an embodiment, a monitor unit of a semiconductor system SYS1, driven by a power supply voltage SVCC different from a power supply voltage VDD to be supplied to an internal circuit 10 to be monitored, includes a voltage monitor 11 for monitoring the power supply voltage VDD, and a delay monitor 12, driven by the power supply voltage VDD, for monitoring signal propagation time on a critical path in the internal circuit 10. The delay monitor 12 is configured so that the largest on-resistance, among on-resistance of a plurality of transistors configuring the delay monitor 12, becomes smaller than the largest on-resistance, among on-resistance of a plurality of transistors configuring the internal circuit 10.SELECTED DRAWING: Figure 6 【課題】監視対象回路の最低動作電圧を精度良くモニタすることが可能な半導体装置、半導体システム及び半導体装置の製造方法を提供すること。【解決手段】一実施の形態によれば、半導体システムSYS1のモニタ部は、監視対象回路である内部回路10に供給される電源電圧VDDとは異なる電源電圧SVCCによって駆動され、電源電圧VDDをモニタする電圧モニタ11と、電源電圧VDDによって駆動され、内部回路10におけるクリティカルパスの信号伝搬時間をモニタする遅延モニタ12と、を備え、遅延モニタ12は、遅延モニタ12を構成する複数のトランジスタのそれぞれのオン抵抗のうち最も大きなオン抵抗が、内部回路10を構成する複数のトランジスタのそれぞれのオン抵抗のうち最も大きなオン抵抗よりも小さくなるように、構成されている。【選択図】図6
Bibliography:Application Number: JP20170168124