FINE STRUCTURE MACHINING METHOD AND DEVICE

To reduce the nonuniformity of a machining shape over a wide range of a single field of view.SOLUTION: Disclosed is a method for machining a fine structure by first and second steps in a device comprising a radiation part for directing a charged particle beam toward a sample, a shape measurement par...

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Bibliographic Details
Main Authors MINE TOSHIYUKI, SHICHI HIROYASU, WATANABE KEIJI, RYUZAKI DAISUKE, SAGAWA MISUZU
Format Patent
LanguageEnglish
Japanese
Published 14.03.2019
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Summary:To reduce the nonuniformity of a machining shape over a wide range of a single field of view.SOLUTION: Disclosed is a method for machining a fine structure by first and second steps in a device comprising a radiation part for directing a charged particle beam toward a sample, a shape measurement part for measuring a shape of the sample, and a control part. In the first step, the radiation part directs a charged particle beam toward a plurality of locations of a single field of view in a first region of the sample; the shape measurement part measures the shape of a spot hole formed in the first region of the sample; and the control part sets a scan condition of the charged particle beam or a shaping mask for the charged particle beam in the respective locations in the single field of view based on a measurement result of the shape of the spot hole. In the second step, the radiation part directs the charged particle beam toward a second region of the sample based on the scan condition or shaping mask set in the first step.SELECTED DRAWING: Figure 3 【課題】単一視野の広範囲にわたって加工形状の不均一性を低減させること。【解決手段】荷電粒子ビームを試料へ照射する照射部と、試料の形状を計測する形状計測部と、制御部と、を備えた装置において、第1の工程及び第2の工程により微細構造体を加工する方法である。第1の工程では、照射部は、試料の第1の領域において、単一視野の複数箇所へ荷電粒子ビームを照射し、形状計測部は、試料の第1の領域に形成されたスポット穴の形状を計測し、制御部は、スポット穴の形状の計測結果に基づいて、単一視野のそれぞれの箇所における荷電粒子ビームのスキャン条件又は荷電粒子ビームの成形マスクを設定する。第2の工程では、照射部は、第1の工程において設定されたスキャン条件又は成形マスクに基づいて、試料の第2の領域へ荷電粒子ビームを照射する。【選択図】図3
Bibliography:Application Number: JP20170161825