IMPRINT METHOD, IMPRINT APPARATUS, PROGRAM, FOREIGN MATTER REMOVAL METHOD AND FOREIGN MATTER REMOVAL DETERMINATION METHOD

To provide an imprint method that is advantageous in terms of suppression of a pattern defect.SOLUTION: An imprint method that fills an imprint material on a pattern by contacting a pattern of a mold with an imprint material of a plurality of shot regions on a substrate and forming the pattern of th...

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Bibliographic Details
Main Author TERAO TSUTOMU
Format Patent
LanguageEnglish
Japanese
Published 21.02.2019
Subjects
AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
SEMICONDUCTOR DEVICES
SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR
SHAPING OR JOINING OF PLASTICS
TRANSPORTING
WORKING OF PLASTICS
WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Summary:To provide an imprint method that is advantageous in terms of suppression of a pattern defect.SOLUTION: An imprint method that fills an imprint material on a pattern by contacting a pattern of a mold with an imprint material of a plurality of shot regions on a substrate and forming the pattern of the imprint material on the substrate repeats a series of steps comprising: a contact step that contacts an imprint material of one shot region of the plurality of shot regions with the mold; an imaging step that images the one shot region to acquire an image in a state in which the mold and the imprint material contacts each other; a determination step that determines whether a foreign matter is included in the imprint material on the basis of the image; a removal step that removes the foreign matter when it is determined that the foreign matter is included in the determination step; and an alignment step that aligns a shot region being different from the one shot region with the pattern after the removal step, until it is determined that the foreign matter is not included in the determination step.SELECTED DRAWING: Figure 4 【課題】パターン欠陥の抑制の点で有利なインプリント方法を提供する。【解決手段】型のパターンと、基板上の複数のショット領域のインプリント材と、を接触させてパターンにインプリント材を充填させ、基板上にインプリント材のパターンを形成するインプリント方法であって、型と、複数のショット領域のうち、ひとつのショット領域のインプリント材と、を接触させる接触工程と、型とインプリント材とが接触している状態において、ひとつのショット領域を撮像して画像を取得する撮像工程と、画像に基づいて、インプリント材に異物が含まれているか否かを判定する判定工程と、判定工程において、異物が含まれていると判定した場合、異物を除去する除去工程と、除去工程の後、ひとつのショット領域とは異なるショット領域とパターンとを位置合わせする位置合わせ工程と、を含む一連の工程を、判定工程において異物が含まれていないと判定されるまで繰り返す。【選択図】図４
Bibliography:Application Number: JP20170150662