HOLLOW POROUS FILM AND METHOD FOR PRODUCING THE SAME

To provide a hollow porous film which can achieve both excellent permeable performance and excellent fraction performance over a long period of time.SOLUTION: A hollow porous film 1 has a film layer formed of polyvinylidene fluoride, where a mass average molecular weight (Mw) of the polyvinylidene f...

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Bibliographic Details
Main Authors HINENOYA MITSURU, TAKAHASHI SHUSAKU, TERAMACHI MASASHI
Format Patent
LanguageEnglish
Japanese
Published 14.02.2019
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Summary:To provide a hollow porous film which can achieve both excellent permeable performance and excellent fraction performance over a long period of time.SOLUTION: A hollow porous film 1 has a film layer formed of polyvinylidene fluoride, where a mass average molecular weight (Mw) of the polyvinylidene fluoride is 2.0×10or more and 1.2×10or less, the polyvinylidene fluoride has a ratio (Mw/Mn) of the mass average molecular weight (Mw) to the number average molecular weight (Mn) of 4.0 or less, and in the polyvinylidene fluoride, particles with a particle diameter of 0.022 μm or more are 1.2×10pieces/cmor less in an N,N-dimethyl acetamide solution obtained by dissolving polyvinylidene fluoride in N,N-dimethyl acetamide so that a content of the polyvinylidene fluoride is 5 mass%.SELECTED DRAWING: Figure 1 【課題】長期にわたって、優れた透水性能と優れた分画性能とを両立できる中空状多孔質膜を提供する。【解決手段】ポリフッ化ビニリデンからなる膜層を有する中空状多孔質膜1であって、前記ポリフッ化ビニリデンの質量平均分子量(Mw)が2.0×105以上、1.2×106以下であり、前記ポリフッ化ビニリデンは、質量平均分子量(Mw)と数平均分子量(Mn)の比(Mw/Mn)が4.0以下であり、前記ポリフッ化ビニリデンは、ポリフッ化ビニリデンの含有量が5質量%となるようにポリフッ化ビニリデンをN,N−ジメチルアセトアミドに溶かして得られるN,N−ジメチルアセトアミド溶液中の、粒径0.022μm以上の粒子が1.2×1016個/cm3以下となるポリフッ化ビニリデンである。【選択図】図1
Bibliography:Application Number: JP20180210059