STAGE DEVICE, EXPOSURE DEVICE AND EXPOSURE METHOD

To prevent infiltration of a liquid between a substrate and a holder even when an exposure process is performed with the liquid filling between a projection optical system and the substrate.SOLUTION: A stage device comprises: a holder that has a substrate holding surface for holding a substrate; a s...

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Bibliographic Details
Main Authors KONO HIROTAKA, SHIRAISHI KENICHI, NISHII YASUFUMI
Format Patent
LanguageEnglish
Japanese
Published 31.01.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:To prevent infiltration of a liquid between a substrate and a holder even when an exposure process is performed with the liquid filling between a projection optical system and the substrate.SOLUTION: A stage device comprises: a holder that has a substrate holding surface for holding a substrate; a stage that travels while sustaining the holder; and a recovery device that is positioned near the holder, has a lyophilic portion being at least partially lyophilic, and recovers a liquid by means of the lyophilic portion.SELECTED DRAWING: Figure 4 【課題】投影光学系と基板との間を液体で満たして露光処理する場合においても、基板とホルダとの間に液体が浸入することを防止する。【解決手段】基板を保持する基板保持面を有したホルダと、ホルダを支持して移動するステージとを備えたステージ装置であって、ホルダの近傍に配置され、少なくとも一部が親液性を有する親液部を有し、親液部を用いて液体を回収する回収装置を備える。【選択図】図４
Bibliography:Application Number: JP20180197059