RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERNING METHOD, RADIATION-SENSITIVE ACID GENERATOR AND COMPOUND

• Main Author: NAMAI HAYATO
• Format: Patent
• Language: English; Japanese
• Published: 17.01.2019
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; ELECTROGRAPHY; HETEROCYCLIC COMPOUNDS; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide a radiation-sensitive resin composition that forms a resist pattern that exhibits excellent MEEF performance, focal depth and exposure margin and has excellent LWR performance, CD uniformity, resolution, and cross-sectional rectangularity.SOLUTION: A radiation-sensitive resin composition has a polymer having a structural unit containing an acid dissociable group, a compound containing an onium cation and a counter anion having radiation degradable properties, and a solvent. The counter anion has two or more carbonyl groups. The carbonyl groups are bonded through a single bond or a C1-10 substituted or unsubstituted alkanediyl group.SELECTED DRAWING: None 【課題】優れたＭＥＥＦ性能、焦点深度及び露光余裕度を発揮すると共に、優れたＬＷＲ性能、ＣＤ均一性、解像性、断面形状の矩形性を有するレジストパターンを形成する感放射線性樹脂組成物の提供を目的とする。【解決手段】本発明は、酸解離性基を含む構造単位を有する重合体、放射線分解性を有するオニウムカチオンとカウンターアニオンとからなる化合物、及び溶媒を含有し、上記カウンターアニオンが、カルボニル基を２以上有し、上記カルボニル基同士が、単結合又は炭素数１〜１０の置換又は非置換のアルカンジイル基を介して結合する感放射線性樹脂組成物である。【選択図】なし