VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK APPARATUS, METHOD OF MANUFACTURING VAPOR DEPOSITION MASK, METHOD OF MANUFACTURING VAPOR DEPOSITION MASK APPARATUS, AND VAPOR DEPOSITION METHOD

• Main Authors: HATSUDA CHIAKI, SEKI KENTARO, IKENAGA CHIKAO, FURUSHO HIROKI, SHIMAZAKI HIROSHI
• Format: Patent
• Language: English; Japanese
• Published: 17.01.2019
• Subjects: APPARATUS THEREFOR; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROFORMING; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To provide a vapor deposition mask which can be suppressed from deforming in ultrasonic cleaning, a method of manufacturing the vapor deposition mask, and a metal plate.SOLUTION: The present invention relates to a vapor deposition mask and a method of manufacturing the vapor deposition mask such that: the method of manufacturing the vapor deposition mask comprises a process of forming, on a base material by plating, a mask body provided with a through hole that a vapor deposition material passes when the vapor deposition material is vapor-deposited on a vapor-deposited substrate, and a process of separating the mask body from the base material; and the vapor deposition mask 20 comprises the mask body 28, and the through hole 25, provided in the mask body 28, that the vapor deposition material passes through when the vapor deposition material is vapor-deposited on a vapor-deposited substrate, the mask body 28 satisfying y≥950 and y≥23x-1,280, where x is an indentation elastic modulus (GPa) and y is a 0.2% proof strength (MPa).SELECTED DRAWING: Figure 4 【課題】超音波洗浄時に変形することを抑制できる蒸着マスク、蒸着マスクの製造方法および金属板を提供する。【解決手段】基材上に、めっき処理によって、蒸着材料を被蒸着基板に蒸着させる際に蒸着材料が通過する貫通孔が設けられたマスク本体を形成する工程と、前記マスク本体を前記基材から分離させる工程と、を備え、蒸着マスク２０は、マスク本体２８と、マスク本体２８に設けられ、蒸着材料を被蒸着基板に蒸着させる際に蒸着材料が通過する貫通孔２５と、を備え、マスク本体２８は、インデンテーション弾性率をｘ（ＧＰａ）、０．２％耐力をｙ（ＭＰａ）としたときに、ｙ≧９５０、かつ、ｙ≧２３ｘ−１２８０を満たしている蒸着マスク、および蒸着マスクの製造方法。【選択図】図４