EXPOSURE METHOD, EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING ARTICLE

• Main Author: GOTO YOSHIO
• Format: Patent
• Language: English; Japanese
• Published: 10.01.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide an exposure method by which uniformity of line width can be improved by a simple method.SOLUTION: The exposure method comprises illuminating a pattern formed on an original plate to expose a plurality of exposure regions on a substrate, and includes a step of moving the substrate in a per...